Papers

Analysis of the energy distribution of interface traps related to tunnel oxide degradation using charge pumping techniques for 3D NAND flash applications (IF 4.019 ; JCR 29.777% )

2013
작성자
유경종
작성일
2013-05-24 17:38
조회
153
저널명 : Materials Research Bulletin, 48(12) 5084-5087 (2013, DEC)
논문 저자
Ho Myoung An, Hee Dong Kim, and Tae Geun Kim*
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