Papers

Variation of Poly-Si Grain Structures under Thermal Annealing and its Effect on the Performance of TiN/Al2O3/Si3N4/SiO2/Poly-Si Capacitors / Applied Surface Science (IF 3.387 ; JCR 2.632%)

2019
작성자
김나현
작성일
2019-05-24 15:44
조회
197
저널명 : Applied Surface Science, 477 104-110 (2019, MAY)
논문 저자
Suk Bum Hong, Ju Hyun Park, Tae Ho Lee, Jun Hee Lim, Changhwan Shin, Young Woo Park, Tae Geun Kim*
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