Papers

Effect of work function difference between top and bottom electrodes on the resistive switching properties of SiN films (IF 4.221 ; JCR 17.857% )

2013
작성자
유경종
작성일
2013-05-24 17:29
조회
214
저널명 : IEEE Electron Device Letters, 34(9) 1181-1183 (2013, SEP)
논문 저자
Seok Man Hong, Hee Dong Kim, Ho Myoung An, and Tae Geun Kim*
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