Papers

Bias temperature instability analysis on memory properties improved by hydrogen annealing treatment in Ti/HfOx /Pt capacitors (IF 2.291 ; JCR 44.839% )

2013
작성자
유경종
작성일
2013-05-24 17:33
조회
172
저널명 : Physica Status Solidi - Rapid Research Letters, 7(7) 497-500 (2013, JUL)
논문 저자
Hee-Dong Kim, Min Ju Yun, Seok Man Hong, Ho Myoung An, Tae Geun Kim*
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